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Si Metal Sputtering Target

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Customized by drawing Si rotary metal sputtering target
304 SS/316L stainless steel magnetron sputtering coa...
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The flat panel Display coating industry brass target...
uniform grain size high purity 99.8%~99.99% arc tita...
good compactness>99% (no porasity) 8020wt% nickel ch...
10WT% ITO glass Indium tin oxide magnetron sputteri...
high purity99.8%~99.99% silicon aluminium alloy sput...

Si Metal Sputtering Target - Manufacturers, Factory, Suppliers From China

Si Metal Sputtering Target, , , , Si Metal Sputtering Target,

The flat panel Display coating industry round p...
L4000mm*W400mm*T40mm with hole or step Si+Cu bo...
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high purity 99.999% Silicon magnetron sputterin...
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high purity99.9%~99.95% Cobalt alloy magnetron ...
magnetron sputtering coating target ALT2017019C
magnetron sputtering coating target tantalum sp...
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uniform grain size high purity 99.8%~99.99% arc...
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1801，Qiushi building, Zhuzilin, Futian District, Shenzhen, Guangdong,China
Phone: +86-755-83668990
E-mail: wfen_452@alluter.com
Fax: +86-755-83660661
Whatsapp: +86-18565772108

Latest News

Alluter Expands Capacity plan in 2017-2018

Alluter company was expanding rotary target production capacity in China on Oct 2017. The expansion will increase capacity by 80% in Guizhou factory. The increased capacity will enable Alluter to support the rapidly g...

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